Vacuum Gauge

Introduction Semiconductor manufacturing operates at the extreme edge of vacuum technology. Every wafer fabrication step—from deposition and etching to lithography and metrology—depends on precise control of residual gas pressure. A fluctuation of even 5 % at 5 × 10−7 Torr can introduce particles, shift etch profiles, or degrade film uniformity, directly impacting device yield and

Introduction Vacuum pumps are the heart of any vacuum system, yet they are surprisingly vulnerable to damage from improper pressure conditions. Overpressure during roughing, sudden gas bursts, or running a turbo-molecular pump against atmosphere can cause overheating, bearing wear, or catastrophic failure—leading to expensive repairs, unplanned downtime, and lost production. Modern vacuum gauges eliminate these

Introduction Physical vapor deposition (PVD) and thin-film coating systems demand precise pressure control across a wide range—from atmosphere during venting and load-lock cycling to high vacuum during sputtering or evaporation. A gauge that cannot deliver stable, repeatable readings in both regimes will cause thickness variations, poor adhesion, or arcing that scrapes entire batches. Engineers and