In thin film deposition processes such as physical vapor deposition (PVD), sputtering, and chemical vapor deposition (CVD), vacuum pressure is a fundamental process parameter. Accurate vacuum measurement directly determines film thickness uniformity, adhesion strength, microstructure, and overall coating performance. Engineers and procurement teams who specify vacuum gauges understand that even small deviations in pressure reading

In high-vacuum sputtering systems used for thin-film deposition in semiconductors, optics, and advanced coatings, pressure must be monitored accurately and reliably at process levels typically between 10⁻³ and 10⁻² Torr while tolerating intense plasma, metal vapors, and reactive gases. Traditional hot-cathode ionization gauges struggle in these environments because their heated filaments are easily damaged or

In lithium-ion battery manufacturing, vacuum technology is essential for electrode drying, electrolyte filling, and cell formation to achieve the ultra-low moisture levels required for high-performance, long-life cells. Even trace water or solvent residues can trigger side reactions, reduce capacity, or cause safety issues. Precise vacuum measurement across a wide pressure range is therefore non-negotiable. Poseidon