Vacuum Gauge

Why Cold Cathode Gauges Are Preferred in Harsh Coating Environments Physical vapor deposition (PVD), chemical vapor deposition (CVD), sputtering, and other thin-film coating processes create some of the most demanding vacuum environments in industry. Reactive gases, high plasma densities, sputtered material, and frequent chamber venting combine to accelerate gauge contamination and sensor degradation. In these […]

Choosing Vacuum Gauges for Plasma Etching Systems Plasma etching systems, including reactive ion etching (RIE) and inductively coupled plasma (ICP) tools, require precise vacuum measurement to maintain stable plasma density, etch rate uniformity, and process repeatability. Operating pressures typically fall between 10⁻¹ and 10⁻⁴ Torr, with reactive gases such as CF₄, SF₆, O₂, and Cl₂

Improving High Vacuum Stability in Optical Coating Applications Optical coating processes—whether for anti-reflective layers on lenses, high-reflectivity mirrors, or precision filters—demand exceptional vacuum stability in the 10⁻⁴ to 10⁻⁷ Torr range. Even small pressure excursions can alter mean free path, deposition rate, and film stoichiometry, resulting in wavelength shifts, reduced durability, or increased scatter. Engineers