Vacuum Gauge Sensitivity to Electromagnetic Fields in Sputtering Systems
In physical vapor deposition (PVD) and magnetron sputtering systems, accurate vacuum measurement is essential for process stability, film uniformity, and equipment protection. Yet the very plasma that enables deposition—driven by RF or pulsed-DC power supplies—generates intense electromagnetic interference (EMI) that can corrupt gauge signals. Engineers routinely observe noisy analog outputs, false pressure readings, delayed cold-cathode […]
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