Cold Cathode vs Pirani in Semiconductor Etch Chambers
Overview of Semiconductor Etch Vacuum Stages Semiconductor etch chambers operate through tightly sequenced vacuum stages that directly influence etch rate, selectivity, anisotropy, and wafer-to-wafer repeatability. A typical reactive ion etch (RIE) or inductively coupled plasma (ICP) tool cycles through: Load-lock / atmospheric transfer: Chamber vents to atmosphere, wafer loads, then rough-pumped from ~1013 mbar to […]
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